14/08/2026
Japan holds exceptionally high global market shares in several critical technologies and materials used in advanced semiconductor manufacturing.
EUV Coater/Developer Systems
Tokyo Electron has an almost complete share of this market.
In EUV lithography, photoresist must first be applied uniformly to the wafer surface. After exposure, the resist is developed to form extremely fine circuit patterns.
Coater/developer systems perform these resist coating and development processes.
Tokyo Electron holds approximately 100% of the market for EUV coater/developer systems, making it a critical supplier for leading-edge semiconductor manufacturing and continued device scaling.
EUV Mask Inspection
Lasertec has a dominant position in this field.
Because EUV lithography is used to produce extremely fine circuit patterns, even minute defects on EUV masks or mask blanks can result in manufacturing defects.
Lasertec supplies highly advanced inspection systems capable of detecting defects in EUV masks and mask blanks.
In particular, Lasertec has a near-100% share in certain areas of actinic inspection, where EUV light itself is used to detect defects under conditions relevant to actual EUV lithography.
Mask quality control is essential for high-volume EUV manufacturing, giving Japanese technology a dominant position in this critical inspection process.
ABF
ABF stands for Ajinomoto Build-up Film.
Ajinomoto holds more than 95% of the global market.
ABF is an insulating material used in advanced package substrates for high-performance semiconductor devices such as CPUs and GPUs.
Modern high-performance semiconductors require extremely dense multilayer interconnect structures. ABF provides electrical insulation between these wiring layers.
Major applications include CPUs, GPUs, AI accelerators, and semiconductor devices for data centers.
As semiconductor performance increases and package interconnect density continues to rise, ABF is becoming increasingly important to advanced semiconductor packaging.
EUV Photoresists
Japanese companies collectively hold approximately 90–95% of the global market.
Major suppliers include JSR, Tokyo Ohka Kogyo, Shin-Etsu Chemical, and FUJIFILM.
EUV photoresists are photosensitive materials that undergo chemical reactions when exposed to EUV radiation, enabling extremely fine circuit patterns to be formed on semiconductor wafers.
Leading-edge semiconductor manufacturing requires extremely precise pattern formation. EUV photoresists therefore require high sensitivity, high resolution, extremely low defectivity, very high purity, and precise control of line-edge roughness.
Japanese companies dominate the global market through their advanced materials engineering and manufacturing capabilities in these areas.
EUV Mask Blanks
Major Japanese suppliers include HOYA and AGC.
EUV mask blanks are the base materials from which EUV photomasks are manufactured.
Their production requires extremely precise formation of multilayer reflective coatings, protective layers, and absorber layers on low-thermal-expansion glass substrates.
Even extremely small surface defects or variations in film thickness can affect pattern transfer, requiring exceptionally high levels of material quality and manufacturing precision.
Japanese companies hold approximately 90–93% of the global EUV mask blank market.
Japan therefore has a very strong position in both the production of EUV mask blanks and the technologies used to inspect them.
# # # Ultra-High-Purity Polishing Materials
Semiconductor manufacturing uses a planarization process known as CMP, or Chemical Mechanical Polishing.
Because semiconductor devices are fabricated by repeatedly building up multiple wiring and insulating layers, each layer must be planarized with nanometer-scale precision before subsequent processing.
CMP slurries are used for this purpose.
Japanese companies such as Fuso Chemical hold approximately 90% of the global market for ultra-high-purity colloidal silica used as a key material in these advanced polishing processes.